Planar Sputtering Target

Stanford Advanced Materials provides a wide range of planar targets for large area deposition and other market applications.

Cast: Our product includes Mo, In alloys, Cu, Si, Ti alloys and other materials. Targets can be cast directly to a backing plate or bonded. SAM provides material-specific re-casting service.

HIP/Hot-pressed/Sintered: SAM offers a range of targets made using powder-metallurgical and ceramic processing methods. These include, but are not limited to, ATO, AZO, Cr, ITO etc.

Rolled/Forged/Brazed: SAM provides custom engineering and unique thermo-mechanical process solutions (e.g., grain-size control) for various materials, including Ag, Nb, NiCr, Ta and Zr.

SAM Main Planar Target Products

Planar Copper (Cu) Sputtering Target
Planar Copper (Cu) Sputtering Target
Planar Molybdenum (Mo) Sputtering Target
Planar Molybdenum (Mo) Sputtering Target
Planar Titanium (Ti) Sputtering Target
Planar Titanium (Ti) Sputtering Target