Stanford Advanced Materials provides a wide range of planar targets for large area deposition and other market applications.
Cast: Our product includes Mo, In alloys, Cu, Si, Ti alloys and other materials. Targets can be cast directly to a backing plate or bonded. SAM provides material-specific re-casting service.
HIP/Hot-pressed/Sintered: SAM offers a range of targets made using powder-metallurgical and ceramic processing methods. These include, but are not limited to, ATO, AZO, Cr, ITO etc.
Rolled/Forged/Brazed: SAM provides custom engineering and unique thermo-mechanical process solutions (e.g., grain-size control) for various materials, including Ag, Nb, NiCr, Ta and Zr.
SAM Main Planar Target Products
![Planar Copper (Cu) Sputtering Target](http://www.sputtering-targets.net/wp-content/uploads/2019/01/Planar-Copper-Cu-Sputtering-Target-300x220.jpg)
![Planar Molybdenum (Mo) Sputtering Target](http://www.sputtering-targets.net/wp-content/uploads/2019/01/Planar-Molybdenum-Mo-Sputtering-Target-300x220.jpg)
![Planar Titanium (Ti) Sputtering Target](http://www.sputtering-targets.net/wp-content/uploads/2019/01/Planar-Titanium-Ti-Sputtering-Target-300x199.jpg)