Rotatory Sputtering Target

Rotatory sputter target technology has been widely used in the area of architectural glass and flat panel displays coating manufacturing. The standard manufacturing methods are plasma spraying onto the base tubes, casting and extrusion of the complete assembly.

Comparing with planar targets, rotatory target contains more material and offers a greater utilization, which means longer production runs and reduced downtime of the system, increases the throughput of the coating equipment. Besides, rotary sputter target allows the use of higher power densities due to the heat build-up being spread evenly over the surface area of the target. As a consequence, an increased deposition speed can be seen along with improved performance during reactive sputtering.

SAM Main Rotatry Target Products

Rotatory Copper (Cu) Sputtering Target
Rotatory Copper (Cu) Sputtering Target
Rotatory Titanium (Ti) Sputtering Target
Rotatory Titanium (Ti) Sputtering Target