Category: Metal

3 Minutes to Know PVD Gold Sputtering

Gold is a popular precious metal that has been used for centuries as currency, hedging and jewelry for its noble and beautiful gold color.

PVD Gold Sputtering

Gold sputtering coating is a thin film deposition process in which gold or gold alloy is bombarded with high-energy ions in a vacuum chamber, causing gold atoms or molecules to be “sputtered” into the vapor and condensed on the substrate to be coated. Sputtering is one method of the PVD (Physical Vapor Deposition) process, the other two of which are thermal evaporation deposition and electron beam vapor deposition, and gold is also applied in these two methods. In thermal evaporation deposition, gold evaporates in a low-pressure environment with resistive heating elements; and in electron beam vapor deposition, gold is heated by an electron beam, and then condensed on the substrate to be coated.

Gold Plating

Apart from PVD coating, there are other ways for gold coatings such as gold plating and gold filling. Gold plating is a method that deposits a thin layer of gold on the surface of another metal by chemical or electrochemical plating. The advantages of gold plating are inexpensive and easy. However, the coating it produces is relatively soft and less durable, and what’s worse, its chemical process would cause pollution that is far away from environmentally friendly.

Gold Filling

Gold filling is the mechanical bonding of gold to metal under high temperatures and pressure. It produces a thicker coating than PVD gold sputtering and gold plating, and thus it is usually more expensive.

Advantages of PVD gold sputtering

The constant contact of skin or clothing may abrade the coatings, especially in the watch and jewelry industry. Thus, PVD gold sputtering is preferred in these two industries because the coatings it produces are harder and more durable than that of electrolytic gold plating or gold filling.

Compared to other types of gold coatings, the main advantages of PVD gold sputtering coating are their durability, retention of gloss, corrosion resistance, and abrasion resistance in contact with the skin, thus extending the life of the jewelry. PVD gold sputtering not only provides the exact color and brightness which evokes the general feeling of love and attraction with jewelry, but also has the advantage of being more environmentally friendly and durable than gold plating or gold filling for producing a gold coating.

Stanford Advanced Materials(SAM) is a global sputtering targets manufacturer which supplies high-quality and consistent products to meet our customers’ R&D and production needs.

Application and Recycling of Tungsten Metals

Tungsten, a relatively rare and exotic metal, has been widely used in many products in our daily life. Tungsten has the advantages of high melting point, high hardness, excellent corrosion resistance, and good electrical and thermal conductivity. Most of its applications are based on these properties. Tungsten is not cheap because of its scarcity, but the price of tungsten is quite reasonable compared with the prices of other rare and exotic metals.

What are the Applications of Tungsten?

Tungsten is an important alloying element for the aerospace industry and the industrial gas turbine industry, because it can significantly improve the strength, hardness, and wear resistance of steel.

Tungsten filament is used in incandescent bulbs to replace tantalum, which was used many years ago, as an integral part of copper and silver electrical contacts for improved wear resistance.  Tungsten wire can also be used to manufacture direct heating cathodes and grids of electronic oscillation tubes and cathode heaters in various electronic instruments.

Tungsten sputtering target & Ta evaporation pellets can be used as wear-resistant coatings for mechanical parts, as evaporating filaments for physical vapor deposition (PVD) of aluminum and silver, and as key barrier electrons for barrier coatings in critical electronic devices.

Some of the other applications of Tungsten include the component of chemicals and catalysts, cutting blades, paints, pigments, inks, lubricants, etc.

How to Recycle Tungsten?

Tungsten’s unique properties of heavy weight, high hardness, and high melting point make tungsten waste ideal for recycling. The fact that it is chemically resistant is a key factor in tungsten recycling. Therefore, recycling tungsten-bearing scrap is more popular. The methods of tungsten recycling can be roughly divided into the direct method and the indirect method.

Direct Tungsten Recycling

The direct method means that the tungsten waste is converted into a powder of the same composition by chemical or physical treatment or a combination of both. A typical example of a direct method is a zinc treatment method. This method has many advantages, such as limited energy consumption and chemical waste, as well as low production costs. A disadvantage of this method is the limitation on recycled materials.

Indirect Tungsten Recycling

Indirect methods, such as wet chemical processing, are commonly used in refining processes. This type of recycling has no restrictions on materials, but requires a lot of chemicals and energy.

For more information, please visit https://www.sputtertargets.net/.

Advantages of Investing in Platinum and Palladium Precious Metals

Platinum and palladium are in the class of precious metals just like gold and silver in spite of little information concerning their investments. The difference is that they are not in form of currency because they are in form of industrial metal, and belong to a group called platinum metals group.

Platinum

The fact that platinum is not a monetary metal confers advantages and disadvantages alike. First, it can be affected by demand issues due to its industrial nature and hence suffer massive price fluctuations sue to speculation. Secondly, it does not have the global attraction that gold and silver have as monetary metals. However, the fact that it non-monetary ensures that it is not targeted for confiscation as is the case with silver and gold. Second, the historic hart of the metal has shown that its price goes hand in hand with gold value over time even though it is more of an industrial metal. This tells you that it is a worth investment.

Related: Platinum Sputtering Target

Ways to Buy Platinum

There are a number of reputable dealers that can be contacted online. These dealers have established stores in Hong Kong, Switzerland or London. You can buy in small quantities from independent but reputable companies. For bulk buying, ensure that there is an arrangement for adequate storage because safety is of great importance. Second, you can explore mints that can produce bullion coins in the U.S, Canada, Australia, and China. The coins are available in the denominations between a tenth of an ounce and one troy ounce. Collectors tend to be more expensive than mints since most coins are regarded as collector’s items. Finally, you can consider collecting old or scrap platinum jewelry from second hand or coin shops. Another advantage of buying platinum jewelry is the authenticity and purity that comes with them.

Palladium

Palladium has lesser value compared to platinum and heavily relies on industrial demand behavior. For instance, palladium is expected to be a key part of the cold fusion technology that all industrialized nations are looking up to for energy solutions. Sharp investors are eager to become part of this booming technology by investing in palladium.

Related: Palladium Sputtering Target

Buying Palladium

An investor should look at reputable independent companies to buy palladium. It is available in bars and coins. For investors that want to start small, you can start with ounces or even smaller quantities.

For more information about precious metals, please visit https://www.sputtertargets.net/.

Applications of High Purity Copper Sputtering Target

The copper sputtering target is a coating material made of metallic copper, which is suitable for DC bipolar sputtering, three-pole sputtering, four-stage sputtering, radio frequency sputtering, counter target sputtering, ion beam sputtering, and magnetron sputtering, etc. It can be applied to manufacture reflective films, conductive films, semiconductor films, capacitor films, decorative films, protective films, integrated circuits, displays, and etc. Compared with other precious metal sputtering targets, the price of copper targets is lower, so the copper target is the preferred target material under the premise of satisfying the function of the film layer.

Copper sputter targets are divided into the planar copper target and rotary copper target. The former is sheet-shaped, with round, square, and the like; the latter is tubular, and the utilization efficiency is high.

planar and rotory copper sputtering target

High-purity copper sputter targets are mainly used in electronics and information industries, such as integrated circuits, information storage, liquid crystal displays, laser memories, electronic control devices, etc.; they can be applied to the field of glass coating; they can also be applied to wear-resistant materials, high-temperature corrosion resistance, high-end decorative supplies and other industries.

Information storage industry: With the continuous development of information and computer technology, the demand for recording media in the world market is increasing, and the corresponding target media for recording media is also expanding. Related products include hard disks, magnetic heads, and optical disks. (CD-ROM, CD-R, DVD-R, etc.), a magneto-optical phase-change optical disc (MO, CD-RW, DVD-RAM).

Integrated circuit industry: In the field of semiconductor applications, sputtering targets are one of the main components of the world target market. They are mainly used for electrode interconnect film, barrier film, contact film, optical disk mask, capacitor electrode film, and resistive film, etc.

Flat-panel display industry: Flat panel displays include liquid crystal displays (LCDs), plasma displays (PDPs), and the like. At present, LCD is the main market in the flat panel display market, and its market share exceeds 85%. LCD is considered to be the most promising flat display device and is widely used in notebook monitors, desktop monitors and high definition televisions. The manufacturing process of the LCD is complicated, in which the reflective layer, the transparent electrode, the emitter and the cathode are all formed by a sputtering method, and therefore, the sputtering target plays an important role in the manufacture of LCD.

For more information, please visit https://www.sputtertargets.net/.

Introduction to Aluminum, Aluminum Alloy and Aluminum Sputtering Target

Aluminum is a light metal with low density (2.79/cm3), good strength and excellent plasticity. As for aluminum alloy, the strength of super-hard aluminum alloy can reach 600Mpa, and the tensile strength of ordinary hard aluminum alloy can reach 200-450Mpa, which is much higher than steel in steel. Therefore, aluminum and aluminum alloy are widely used in machinery manufacturing.

The conductivity of aluminum is second only to silver and copper, so aluminum is used in the manufacture of various conductors. Aluminum also has a good thermal conductivity that can be used as a variety of heat dissipating materials. Besides, aluminum has good corrosion resistance and excellent plasticity, and is suitable for various pressure processing.

Aluminum alloy

Aluminum alloy can be divided into the deformed aluminum alloy and the cast aluminum alloy according to the processing method.

The deformed aluminum alloy can be further divided into a non-heat treatable reinforced aluminum alloy and a heat treatable reinforced aluminum alloy. Non-heat-treated reinforced aluminum alloy cannot improve the mechanical properties by heat treatment, and can only be strengthened by cold working deformation. It mainly includes high-purity aluminum, industrial high-purity aluminum, industrial pure aluminum and rust-proof aluminum. The heat-treatable reinforced aluminum alloy can be improved in mechanical properties by heat treatment such as quenching and aging, and can be classified into hard aluminum, wrought aluminum, super-hard aluminum, and special aluminum alloy. The aluminum alloy can be heat treated to obtain good mechanical properties, physical properties and corrosion resistance.

Cast aluminum alloy can be divided into aluminum-silicon alloy, aluminum-copper alloy, aluminum-magnesium alloy and aluminum-zinc alloy according to chemical composition. Cast aluminum alloy is classified into four types according to the main elements other than aluminum in the composition: silicon, copper, magnesium and zinc.

Pure aluminum products

Pure aluminum products are divided into two categories: smelting and pressure processing. The former is represented by chemical composition Al, and the latter is represented by LG (aluminum, industrial). The aluminum sputtering target is a kind of pure aluminum product.

Pressure processing aluminum alloy

Aluminum alloy pressure processing products are divided into seven categories: rustproof (LF), hard (LY), forged (LD), superhard (LC), coated (LB), special (LT) and brazed (LQ). The state of the commonly used aluminum alloy material is three types of annealing (M igniter), hardening (Y), and hot rolling (R).

Aluminum sputtering target

The aluminum sputtering target is one of the sputtering targets used in the vacuum coating industry, and is therefore called aluminum sputtering target. The aluminum target is obtained after a series of processing of high-purity aluminum. It is available in a specific size and shape, which is mounted on a vacuum coater to form a film on the surface of the substrate by sputtering.

Please visit https://www.sputtertargets.net/ for more information.

Sputter Coating Advantages vs. Disadvantages

Sputter coating is the core thin film deposition process in the semiconductor, disk drive, CD and optics industries today.

When a suitable gas (usually argon) and a target material (usually metals) are used to form a glow discharge between the cathode and the anode, the sputtering target is bombarded to cause the atoms to be ejected from the target material——the process is referred to as “sputtering”; the atoms of the sputtering target will be deposited on a substrate, such as a silicon wafer, solar panel or optical device, and this process is known as sputter deposition.

Sputter deposition, as a relatively common physical vapor deposition (PVD) method, has its advantages, such as a wide range of deposition materials and high coating quality.

The table below details the advantages and disadvantages of sputter coating. It is provided by Stanford Advanced Materials and is for informational purposes only.

Advantages Disadvantages
(1) Able to deposit a wide variety of metals, insulators, alloys and composites.

(2) Replication of target composition in the deposited films.

(3) Capable of in-situ cleaning prior to film deposition by reversing the potential on the electrodes .

(4) Better film quality and step coverage than evaporation.

(5) This is partly because adatoms are more  energetic, and film is ‘densified’ by in-situ ion bombardment, and it is easier to heat up to high T than evaporation that is in vacuum.

(6) More reproducible deposition control – same deposition rate for same process parameters (not true for evaporation), so easy film thickness control via time.

(7) Can use large area targets for uniform thickness over large substrates.

(8) Sufficient target material for many depositions.

(9) No x-ray damage.

 (1) Substrate damage due to ion bombardment or UV generated by plasma.

(2) Higher pressures 1 –100 mtorr ( < 10-5 torr in evaporation), more contaminations unless using ultra clean gasses and ultra clean targets.

(3) Deposition rate of some materials quite low.

(4) Some materials (e.g., organics) degrade due to ionic bombardment.

(5) Most of the energy incident on the target becomes heat, which must be removed.

For more information, please visit https://www.sputtertargets.net/sputtering-target-materials.html.

An Overview of Copper Sputtering Target

Copper sputtering targets, as part of vacuum coating materials, are widely applied in tool coating, optics coating, solar coating, and etc.  Copper targets can be put together with metallic copper because they are essentially the same–composed by Cu atoms.

Development of Copper

Copper is one of the earliest metals discovered by mankind and the first metal that humans began to use. Copper beads made of natural copper excavated by archaeologists in northern Iraq are supposed to have been more than 10,000 years old. Methods for refining copper from its ores were discovered around 5000BC and a 1000 or so years later it was being used in pottery in North Africa.

In modern industry, copper was widely used in the power and electronics industries. By the 1960s, copper used in these two industries accounted for 28%. By 1997, these two industries were still the main areas of copper consumption, accounting for Than 25%. Later, copper was widely used in electrical, light industry, machinery manufacturing, construction industry, transportation, and other fields. As far as America is concerned, copper is second only to aluminum in the consumption of non-ferrous materials. Copper has excellent performance and is easy to recycle and recycle. At present, there are already relatively complete recycled copper recycling systems in developed countries. For example, the output of recycled copper in the United States accounts for 60% of the total output, and Germany accounts for 80%.

Copper Sputtering Target Property

Copper is a chemical metal element with the symbol Cu. It is a soft, malleable, and ductile metal with very high thermal and electrical conductivity. A freshly exposed surface of pure copper has a pinkish-orange color. Copper is used as a conductor of heat and electricity, as a building material, and as a constituent of various metal alloys, such as sterling silver used in jewelry, cupronickel used to make marine hardware and coins, and constantan used in strain gauges and thermocouples for temperature measurement.

Material Type Copper
Symbol Cu
Color/Appearance Copper, Metallic
Melting Point 1,083 ℃
Density 8.96 g/cm3
Sputter DC
Type of Bond Indium, Elastomer
Comments Adhesion poor. Use interlayer (Cr). Evaporates using any source material.

From Metal Copper to Copper Sputter Target

The copper sputtering target is a kind of copper product made of the metal copper, and it is used in the sputter coating to produce copper thin film. Simply speaking, there are two methods to make copper sputtering target from metal copper.

Casting: melt the raw material of a certain distribution ratio, pour the alloy solution into a mold to form an ingot, and finally machine it to become a sputtering target. The method is smelted and cast in a vacuum.

Powder metallurgy: melt the raw material of a certain distribution ratio, cast it into an ingot and then pulverize it, isostatically press the powder, and then sintering it at a high temperature to finally form a target.

 

Powder metallurgy process
Powder metallurgy process

Basic Requirement of Copper SputterTarget

In general, when measuring whether the sputtering target meets the primary requirements, one would consider the following indicators:

Purity: Purity has a great influence on the performance of the film produced by sputter coating. Taking copper target as an example, the higher the purity is, the better the corrosion resistance and electrical and optical properties of the sputtered film are.

Impurity content: The impurities in the solid of the target material and the oxygen and water vapor in the stoma are the main pollution sources of the deposition film. Targets for different applications have different requirements of their impurity contents.

Density: The density of the target not only affects the sputtering rate but also affects the electrical and optical properties of the film. Thus, in order to reduce pores in the solids of the target and improve the properties of the sputtered film, the target is usually required to have a higher density.

Grain size and grain size distribution: For the same target, the sputtering rate of the fine-grained target is faster than that of the coarse-grained target; and the thickness of the target sputter-deposited film with a smaller difference in grain size (distributed uniformly) is more uniform.

Information provided by SAM Sputter Targets.

History and Development of Copper

Sorry for that we have not updated the “Metal History” column for a long time. For previous posts of this column, please search the keyword “history”. Today, let us unveil the history of copper.

Copper is one of the earliest metals discovered by mankind and the first metal that humans began to use. Copper beads made of natural copper excavated by archaeologists in northern Iraq are supposed to have been more than 10,000 years old. Methods for refining copper from its ores were discovered around 5000BC and a 1000 or so years later it was being used in pottery in North Africa.

Part of the reason for it being used so early is simply that it is relatively easy to shape. However, it is somewhat too soft for many tools and around 5000 years ago it was discovered that when copper is mixed with other metals the resulting alloys are harder than the copper itself. As examples, brass is a mixture of copper and zinc while bronze is a mixture of copper and tin. For many centuries, bronze reigned supreme, being used for plows, tools of all kinds, weapons, armor, and decorative objects.

Mesopotamia, circa 4500 BC

Pure Metal is ineffective as a weapon and tool because of its softness. But early metallurgy experimentation by the Mesopotamians resulted in a solution to this problem: bronze, an alloy of copper and tin, was not only harder but also could be treated by forging (shaping and hardening through hammering) and casting (poured and molded as a liquid).

Mesopotamia copper

The ability to extract copper from ore bodies has been well developed. In today’s Armenia, bronze and copper alloy tools, including chisels, razors, harpoons, arrows and spearheads, have been traced back to the third millennium BC. A chemical analysis of bronze from the region indicates that common alloys of the time contained approximately 87 percent copper, 10 to 11 percent tin, and small amounts of iron, nickel, lead, arsenic, and antimony.

Egypt, circa 3500 BC

The use of copper in Egypt developed almost at the same time as Mesopotamia. The copper pipe used to transport water was used in the King Sa’Hu-Re temple in Abusir, 2750 BC. These tubes are made of thin copper plate with a diameter of 2.95 inches (75 mm) and a pipe length of nearly 328 feet (100 m). The Egyptians also used copper and bronze as mirrors, razors, utensils, weights and balances, as well as obelisks and ornaments on temples. According to biblical references, the Egyptians used a large number of bronze pillars on the porch of the Solomon Palace in Jerusalem (circa 9th century BC), which were 6 feet (1.83 meters) in diameter and 25 feet (7.62 meters) high.

Egypt copper

China, circa 2800 BC

By the year 2000 BC, bronzes were produced in large quantities in China. Bronze castings found in Henan and Shaanxi provinces and surrounding areas are considered to be the beginnings of Chinese bronzes, although some copper and bronze artifacts used by the Majiayao have been dated as early as 3000 BC.

China copper

Relevant literature shows the direction of metallurgy in China, and discusses in detail the exact proportions of copper and tin used to produce different alloy grades for casting different items such as cymbals and bells, axes, spears, swords, arrows and mirrors.

Modern Development

In modern industry, copper was widely used in the power and electronics industries. By the 1960s, copper used in these two industries accounted for 28%. By 1997, these two industries were still the main areas of copper consumption, accounting for Than 25%. Later, copper was widely used in electrical, light industry, machinery manufacturing, construction industry, transportation and other fields. As far as America is concerned, copper is second only to aluminum in the consumption of non-ferrous materials. Copper has excellent performance and is easy to recycle and recycle. At present, there are already relatively complete recycled copper recycling systems in developed countries. For example, the output of recycled copper in the United States accounts for 60% of the total output, and Germany accounts for 80%.

Information provided by SAM Sputter Targets.

Related Copper Products: Copper Sputtering Target

Reliable Sputtering Target Manufacturer: Stanford Advanced Materials

Part of SAM

Stanford Advanced Materials (SAM) is a global supplier of a series of pure metals, alloys, ceramics and minerals such as oxides, chlorides, sulfides, oxysalts, etc. SAM Sputter Targets is a division of Stanford Advanced Materials, which specializes in manufacturing vacuum coating materials such as sputtering targets and evaporating pellets.

History of SAM

Stanford Advanced Materials was founded in 1994 and now has a history of 25 years.

SAM initially began supplying high-quality rare earth products to assist our customers in research and development (R&D). To meet the growing demand for rare earth products and other materials, SAM now offers sputtering materials not only for our R&D customers but also for manufacturers in the ceramics, metallurgical and electronics industries.

SAM supplies technology-grade materials to the industry and provides research institutions with high-purity chemicals (up to 99.99999%).

Products of SAM

SAM Sputter Targets is your reliable sputtering target manufacturer. SAM has long been committed to providing customers with high quality and reliable sputtering targets at very competitive prices.

Because we understand the importance of reliable and consistent materials to our customers’ R&D and production needs, we have established a strong relationship with our manufacturers.

By regularly visiting our manufacturers and talking to their management, production and quality control engineers and workers on the production line about the quality we seek, we have created truly effective partnerships. These valuable friendships built over the years have enabled us to deliver consistently high quality products to our global customers.

SAM’s motto is “We not only provide products, we also provide satisfactory service.” We believe that you will find SAM one of your favorite sputtering target suppliers.

What SAM Sells:

Alloy Sputtering Targets

Pure Metal Sputtering Targets

Oxide Ceramic Sputtering Targets

Planar Sputtering Targets

Rotatory Sputtering Targets

Click to see our full Product Categories.

For more information, you can contact us by email at target@samaterials.com or by calling (949) 407-8904. You can also visit our website at www.sputtertargets.net for information about our products, services, pricing and news.

Introduction to the Use and Application of Chromium

Chromium is a hard metal that is resistant to corrosion. It is widely used in metallurgy, chemical, cast iron, fire-resistant, and high-end technology. The specific application ratio is shown in the following figure:

specific application ratio of Chromium

Chromium in the Metallurgical Industry

Chromium is a hard metal, and is often incorporated into steel to make hard and corrosion-resistant alloys. Those alloys are mainly used to refine stainless steel, heat-resistant steel and various electric heating materials. When stainless steel encounters corrosive substances, its surface will form a fine and solid chrome oxide film, which protects the internal metal from corrosion. Some stainless steel can maintain its excellent performance even at high temperature of 800 °C. Chrome steel is a good material for manufacturing machinery, tanks and armored vehicles.

Chromium tank

Chromium in the Chemical Industry

Chromium salt is one of the main varieties of inorganic salts and is the main raw material in the chemical industry. It is widely used in daily life, including electroplating, tanning, printing and dyeing, medicine, fuel, catalyst, oxidant, match and metal corrosion inhibitor.

At the same time, metallic chromium has been listed as one of the most important coating metals–chromium sputtering targets for sputter deposition and chromium evaporation materials for evaporation coating. In most cases, the chrome layer is specifically used as the outermost coating for the parts. When chrome is applied, the thinner the chrome layer, the closer it is to the surface of the metal. The chrome layer on the inner walls of some is only five thousandths of a millimeter thick, but after firing thousands of rounds and bullets, the chrome layer still exists. If the surface is not chrome-plated, the service life of most parts will be greatly shortened due to wear and corrosion, and must be replaced or repaired frequently. Therefore, chrome plating is widely used in many industrial manufacturing.

Chromium for Refractory and Cast Iron

Chromite has a high melting point of 1900 °C – 2050 °C, and it can maintain the volume at high temperature and does not react with any slag, so it is used as a lining for refractory materials, steelmaking furnaces and non-ferrous metal smelting furnaces.

chrome brick
Chrome brick

Chromite can be used to make chrome bricks, chrome-magnesia bricks and other special refractory materials. In addition, chromium is also used in cast iron, such as chromium cast ductile iron, which has high strength, high elongation, high impact value and low hardness.

For more information, please visit https://www.sputtertargets.net/.